Re: [jlreq] Example of central-baseline alignment of sideways-ed Latin glyphs within a vertical Japanese line box (#246)

![Screen Shot 2020-12-08 at 9 15 58 AM](https://user-images.githubusercontent.com/7386674/101517818-0764dd00-3936-11eb-8943-82d3ecf4afbf.png)

A fundamental issue is that if you position two runs next to each other with the same Roman baseline (origin), and then show the Japanese metrics next to the Latin metrics, you will see how the two systems are incompatible -- The Latin metrics are not useful when setting text in a Japanese metrics model (CJK emboxes). 
I think we need a system whereby the markup could specify which script (set of metrics and behaviors) is dominant, so all scripts in the line follow the rules of the dominant system. If you set the dominant system to be CJK embox-based, then all other text scripts would be positioned according to their CJK emboxes (calculated by heuristic). If using Latin metrics, all scripts would follow the font Ascent and Descent to place the glyphs on a baseline.

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Received on Tuesday, 8 December 2020 17:22:07 UTC